Ion Implantation Molybdenum Parts For Semiconductor Products
Application:
Semiconductor ion implantation is a new technology of material
surface modification. It has been widely used in the doping of
semiconductor materials, the surface modification of metals,
ceramics, polymers etc. It is a necessary technique in the
contemporary manufacturing large scale integrated circuit.
Ion implantation is the injection of the ion beam with an energy
order of 100keV into a material where the ion beam will have a
series of physical and chemical interactions with atoms or
molecules in the material. The incident ions gradually lose their
energy, and finally stop in the material and cause a change in
composition, structure and properties of the surface of the
material, thus optimizing the surface properties of the material,
or giving some new excellent performance to the material.
Material Property:
Sanhui tungsten and molybdenum components used in ion implantation
have high purity, good mechanical properties to ensure they are
suitable for the processing of arc chamber components with complex
shapes.
High purity tungsten and molybdenum arc chamber is the basic
guarantee for semiconductor chip yield. Sanhui high performance ion
source head tungsten and molybdenum parts greatly reduce the
machine maintenance frequency and ensure the customer's production
capacity, are the best choice for customers.
With a complete set of imported precision machining equipment, with
self-produced materials such as tungsten, molybdenum, tantalum and
niobium as the basis of quality control, and combining advanced
foreign technology, Sanhui can design, produce and process
high-precision and high-quality products according to customer
requirements.
Success Cases:
Sanhui is equipped with complete equipment for processing
refractory materials, and can provide customers with plates,
sheets, bars, rods and complex components made from refractory
metal materials such as tungsten, molybdenum, tantalum, niobium and
their alloys. Sanhui is able to provide tungsten and molybdenum
products used in large-beam, medium-beam and high-energy ion
sources; able to provide tungsten high-energy ion source
components, tungsten or molybdenum large-beam ion implantation
parts, and molybdenum medium-beam ion source components. The
products have been supplied to leading manufacturers in Taiwan, the
United States and other countries and regions.
